| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition superior in size controllability, and to provide a resist pattern forming method. <P>SOLUTION: The positive resist composition includes (A) a resin component having an alkali solvable constitutional unit (a1) including a constitutional unit (a11) derived from (α-methyl)hydroxy styrene and a constitutional unit (a2) having an acid dissociative dissolution suppression group including an acid dissociative dissolution suppression group (II) expressed by the formula and/or a specific chain acid dissociative dissolution suppression group (III), (B) an acid forming agent for generating acid by exposure, and an aromatic amine. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
