MASK, ITS MANUFACTURING METHOD, THREE-DIMENSIONAL FINE STRUCTURE, AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To easily provide a complicated three-dimensional fine structure and a mask having large changes in transmittance for X-rays or the like.

SOLUTION: The mask 10 has a transmissive part 12 and an absorber 13 (13d, 13f) held by the transmissive part 12, and is used to transfer a pattern onto a resist by lithography. The material of the absorber 13 has a pattern corresponding to the pattern to be transferred onto a resist, and exposure depth of the resist varies in accordance with the pattern of the material of the absorber 13.

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