发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING PROCESS
摘要 <P>PROBLEM TO BE SOLVED: To obtain a semiconductor device having excellent characteristics and enhanced reliability in which an SiC wafer can be employed. <P>SOLUTION: A plurality of Schottky barrier diode units 10 are formed in an SiC chip 9 and each unit 10 has an independent external output electrode 4. A bump 11 (having a diameter of several tens to several hundreds &mu;m) is formed only on the external output electrode 4 of an acceptable unit out of the units 10 formed in the SiC chip 9, and a bump is not formed on the external output electrode 4 of a rejectable unit having no breakdown voltage or a large leakage current. Since a bump is not formed in a rejectable unit, the Schottky barrier side electrode 3 is connected from the external output electrode 4 to the bump 11, the wiring layer 13 on a wiring board 12 and an external lead 13a in parallel with the outside, and only the external output electrode 4 of an acceptable unit 10 is connected in parallel. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006173250(A) 申请公布日期 2006.06.29
申请号 JP20040361477 申请日期 2004.12.14
申请人 MITSUBISHI ELECTRIC CORP 发明人 YUYA NAOKI
分类号 H01L21/60;H01L21/66;H01L29/47;H01L29/872 主分类号 H01L21/60
代理机构 代理人
主权项
地址