| 摘要 |
PROBLEM TO BE SOLVED: To clean large substrates uniformly without lowering of cleaning power of the brush while moving them. SOLUTION: A substrate carrying mechanism mounts a substrate 1 on a roller and moves it at a specified speed. A brush unit has two or more disk brushes 2a, 2b, 2c, 2d, 2e and 2f, and mechanisms of adjusting the height of each disk brush are disposed within the brush unit cover 20. Each height-adjusting mechanism adjusts the height of the corresponding disk brush independently to equalize the pressure under which each disk brush comes into contact with the substrate. The brush-moving mechanism reciprocates the brush unit over a specified distance along a slide rail 13 through a link 14 connected to the brush unit cover 20. COPYRIGHT: (C)2006,JPO&NCIPI
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