发明名称 Process applied to semiconductor
摘要 A process applied to grinding, dicing, and/or stacking semiconductors is disclosed. One feature of the process is that after transparent material is stuck on its active surface, a semiconductor is ground from another surface thereof to become thinner, then the semiconductor is diced, by taking advantage of transparency of the transparent material, from its active surface, to obtain at least one smaller semiconductor unit such as die/dice or chip(s). Another feature is that the transparent material remains sticking to the active surface of the die by an adhesion layer until the die is attached to a carrier or another die, and then the transparent material and the adhesion layer are removed by taking advantage of a function of the adhesion layer: receiving a ray to lose adhesion between it and the active surface. Preferably the ray reaches the adhesion layer via the transparent material stuck on the active surface of the die.
申请公布号 US2006137420(A1) 申请公布日期 2006.06.29
申请号 US20050319110 申请日期 2005.12.27
申请人 SILICONWARE PRECISION INDUSTRIES CO., LTD. 发明人 LIU RU- SHENG;TSAI HAN-LUNG;HSIAO CHENG-HSU
分类号 B21C23/00 主分类号 B21C23/00
代理机构 代理人
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