<p>A film forming mask which permits a deposition film to be cleaned and removed without damaging a mask base material and has excellent cleaning workability. The film forming mask (11) is provided with a mask main body (2), which is arranged to face on a film forming plane of a substrate (W) and is provided with an opening part (20) for limiting a film forming area, and a cover member (3) for covering a prescribed area on the surface of the mask main body (2). The cover member (3) is composed of an assembly of a plurality of cover divided pieces (3A-3C) removably attached on the mask main body (2). Adhesion of the deposition film on the mask main body (2) is suppressed by covering the prescribed area on the surface of the mask main body (2) with the cover member (3), and the mask base material is prevented from being damaged while being cleaned. Cleaning operation for removing the deposition film adhered on the cover member (3) is facilitated by performing the operation under the condition where the cover is divided into the cover divided pieces (3A-3C), and the cleaning operation can be easily applied even when the mask size is increased.</p>
