发明名称 METHOD FOR DETERMINING MEASURING CONDITION BY ELECTRON MICROSCOPE
摘要 PROBLEM TO BE SOLVED: To quickly and easily determine the optimum measuring condition, in a sample generating a change in a shape or a dimension by irradiation of an electron beam. SOLUTION: The dimension is measured repeatedly while changing the measuring condition. The measuring condition such as an acceleration voltage is changed to execute the measurement until a shrinkage amount and measurement reproducibility are satisfy preset reference values, and the optimum measuring condition is searched by this manner. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006170924(A) 申请公布日期 2006.06.29
申请号 JP20040367015 申请日期 2004.12.20
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 UEDA KAZUHIRO;MAEDA TATSUYA
分类号 G01B15/00;H01J37/28 主分类号 G01B15/00
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