发明名称 PATTERN INSPECTION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a pattern inspection apparatus capable of rapidly and conveniently creating a recipe and checking a defect. SOLUTION: A defect checking screen includes; a map display section 61 for displaying a wafer map; an image display section 62 for displaying a defective image in a listed fashion; a list display section 63 for displaying and setting detailed information of the defect; and a graph display section 64 for carrying out a graphic display about a selected defect item. Respective display sections operate in conjunction with each other, whereby the defective image, the defect information list and the defect graph are changed in response to selected map information. A classification code, a clustering criterion and a display filter which are input by utilizing the information, are registered into the recipe. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006170907(A) 申请公布日期 2006.06.29
申请号 JP20040366501 申请日期 2004.12.17
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TAKEDA MASATAKE;ITO HIROICHI
分类号 G01N21/956;G01N23/225;H01L21/66 主分类号 G01N21/956
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