发明名称 Photosensitive resin composition, and photosensitive element, method for forming resist pattern and printed wiring board using the composition
摘要 A photosensitive resin composition, characterized in comprising: (A) a polymer having a carbon hydrocarbon double bond and carboxyl group, formed by the reaction of an acid anhydride with the reaction product of an epoxy compound having a structure wherein a glycidyloxy group is bonded to a main chain comprising an aromatic ring, an alkylene group and an oxygen atom, with an unsaturated carboxyl compound having a carbon-carbon double bond and a carboxyl group, (B) a photopolymerizable monomer, (C) a radical photopolymerization initiator, and (D) a curing agent having reactivity with the functional groups of the polymer and/or the photopolymerizable monomer. Using this photosensitive resin composition, a solder resist having excellent resolution, adhesion, PCT resistance, electrical corrosion resistance, heat resistance and thermal impact resistance can be formed.
申请公布号 US2006141381(A1) 申请公布日期 2006.06.29
申请号 US20050530677 申请日期 2005.11.10
申请人 HITACHI CHEMICAL CO., LTD. 发明人 YOSHINO TOSHIZUMI;SATOU KUNIAKI;JOUMEN MASAYOSHI;HAMA MASAYUKI;HAMADA KEISHI;MAMIYA TSUTOMU;KATSURAHARA TOORU;KAWAGUCHI KENICHI
分类号 G03C1/76;G03F7/027;G03F7/038;H05K3/28 主分类号 G03C1/76
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