发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus includes an illumination system configured to provide a radiation beam; a patterning device configured to pattern the radiation beam to form a patterned radiation beam; and a projection system configured to project the patterned radiation beam onto a substrate. An optical assembly includes multiple optical elements two-dimensionally arranged between a radiation source and the patterning device to create a predetermined angular distribution of the radiation beam. In order to improve the uniformity of the radiation beam the optical elements are selected from a predetermined number of optical elements having different shapes and/or sizes.
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申请公布号 |
US2006139599(A1) |
申请公布日期 |
2006.06.29 |
申请号 |
US20040019525 |
申请日期 |
2004.12.23 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
KRUIJSWIJK STEFAN G.;MARIE DIERICHS MARCEL MATHIJS T.;EURLINGS MARKUS FRANCISCUS A.;MULDER HEINE M. |
分类号 |
G03B27/54 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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