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发明名称
EVALUATION METHOD FOR DEFECT AREA OF WAFER
摘要
申请公布号
KR20060073856(A)
申请公布日期
2006.06.29
申请号
KR20040112295
申请日期
2004.12.24
申请人
SILTRON INC.
发明人
PARK, HYUNG KOOK
分类号
H01L21/66
主分类号
H01L21/66
代理机构
代理人
主权项
地址
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