发明名称 Laser treatment apparatus, laser treatment method, and manufacturing method of semiconductor device
摘要 The invention relates to a laser treatment apparatus including a laser oscillator, an interlock provided in the laser oscillator, a movable table which moves with a certain movement period, a timer, an interlock provided in the timer, a sensor which can detect movement of the movable table, and a computer, in which the timer starts measuring time when the sensor senses passage of the movable table, and when the movable table does not pass the sensor even after the movement period, conduction between contacts of the interlock provided in the timer is blocked to operate the interlock in the laser oscillator, thereby stopping laser output. The invention also relates to a laser treatment method using the laser treatment apparatus.
申请公布号 US2006141754(A1) 申请公布日期 2006.06.29
申请号 US20050274272 申请日期 2005.11.16
申请人 发明人 TANAKA KOICHIRO;YAMAMOTO YOSHIAKI;OMATA TAKATSUGU
分类号 H01L21/20;H01L21/36 主分类号 H01L21/20
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