Lithographic apparatus and device manufacturing method
摘要
A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.
申请公布号
EP1674935(A2)
申请公布日期
2006.06.28
申请号
EP20050257885
申请日期
2005.12.20
申请人
ASML NETHERLANDS B.V.;ASML HOLDING N.V.
发明人
BLEEKER, ARNO JAN;BASELMANS, JOHANNES JACOBUS MATHEUS;DIERICHS, MARCEL MATHHIJS THEODORE MARIE;WAGNER, CHRISTIAN;RYZHIKOV, LEV;SMIRNOV, STANISLAV Y;TROOST, KARS ZEGER