Method for producing a photoresist solution

摘要

Preparation of light-sensitive photo resist solution (I) comprises dissolving novolac resin (a) and diazonaphthoquinone-sulfochloride (b) in a solvent of photoresist solvents; reacting 1-70 mol.% of phenolic hydroxy groups of (a) with (b) in the presence of a base; washing the obtained reaction mixture with water and optionally diluting with further photoresist solvent. An independent claim is also included for a method for structured coating of a substrate, comprising preparing (I), applying directly on a pre-baked substrate, exposing the formed photoresist film by a photomask, baking the exposed photoresist film and developing the baked, exposed photoresist film with an alkaline developer.