发明名称 |
System, apparatus and method for automated tapeout support |
摘要 |
A system, apparatus and method for changing/modifying a customer specific reticle set design to a reticle set design that meets a user's process standard. An example embodiment of a method of modifying layout information representing a reticle set design for an integrated circuit comprising the following: receiving layout information and job information; and storing the layout information and the job information; the layout information representing a reticle set design for an integrated circuit and the job information related to the reticle set design; modifying the layout information and the job information to put the layout information and the job information into a first process compatible format; using the layout information and the job information to create mask writer format information for the reticle set design; and storing the mask writer format information; and outputting the mask writer format information. In other embodiments, the method further comprises receiving changes and/or approval for said mask writer format information; and releasing the mask write format information to a mask shop.
|
申请公布号 |
US7069533(B2) |
申请公布日期 |
2006.06.27 |
申请号 |
US20030389718 |
申请日期 |
2003.03.14 |
申请人 |
CHATERED SEMICONDUCTOR MANUFACTURING, LTD |
发明人 |
KOCHPATCHARIN DANCHAI;SU PING JENNIFER TEONG;PHUAN YEE HWEE;LIM ELIZABETH;ZOO KHEAN KENNETH NGEOW;YONG WINSON |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|