发明名称 Electron beam system and electron beam measuring and observing method
摘要 This invention provides an electron beam measuring device capable of performing three-dimensional image measurement of a sample with high precision, irrespective of the tilt angle and height of the sample, by adjusting an electron optical system of a scanning charged-particle beam device so as to be suitable for image measurement. The electron beam measuring device includes a measuring section 20 adapted to tilt a reference template held by a sample holder 3 and an irradiated electron beam 7 relative to each other by means of a sample tilting section 5 , to find the shape or coordinate values of the reference template based on a stereo image photographed by an electron beam detecting section 4 , a calibration data preparing section 30 for comparing the measuring results at the measuring section 20 with known reference data to prepare calibration data for a stereo image photographed by the electron beam measuring device, and a calibration section 40 for performing a calibration based on the calibration data so as to reduce aberration in an image of the sample detected by the electron beam detecting section 4 . Based on the stereo image calibrated by the calibration section 40 , the shape or coordinate values of the sample 9 are found.
申请公布号 US7067808(B2) 申请公布日期 2006.06.27
申请号 US20040962752 申请日期 2004.10.13
申请人 TOPCON CORPORATION 发明人 KOCHI NOBUO;AOKI HIROYUKI
分类号 G01N23/00;G01B15/00;G01N23/225;G06T7/00;G21K7/00;H01J37/28 主分类号 G01N23/00
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