发明名称 |
Method for forming pattern of one-dimensional nanostructure |
摘要 |
Disclosed herein are a method for forming a pattern of a one-dimensional nanostructure, and a pattern of a one-dimensional nanostructure formed by the method. The method comprises the steps of (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film, and selectively exposing the photocatalytic film to light to form latent image centers for crystal growth, (ii) growing metal crystals by plating the latent pattern to form a metal pattern, and (iii) selectively growing a one-dimensional nanostructure on the metal pattern acting as a catalyst.
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申请公布号 |
US7067237(B2) |
申请公布日期 |
2006.06.27 |
申请号 |
US20040876623 |
申请日期 |
2004.06.28 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM JIN YOUNG;NOH CHANG HO;HWANG EUK CHE |
分类号 |
G03F7/00;G03F7/004;H01J9/02 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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