发明名称 Method for forming pattern of one-dimensional nanostructure
摘要 Disclosed herein are a method for forming a pattern of a one-dimensional nanostructure, and a pattern of a one-dimensional nanostructure formed by the method. The method comprises the steps of (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film, and selectively exposing the photocatalytic film to light to form latent image centers for crystal growth, (ii) growing metal crystals by plating the latent pattern to form a metal pattern, and (iii) selectively growing a one-dimensional nanostructure on the metal pattern acting as a catalyst.
申请公布号 US7067237(B2) 申请公布日期 2006.06.27
申请号 US20040876623 申请日期 2004.06.28
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM JIN YOUNG;NOH CHANG HO;HWANG EUK CHE
分类号 G03F7/00;G03F7/004;H01J9/02 主分类号 G03F7/00
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