| 摘要 |
A shield system for use in a plasma chamber, such as a source chamber for an ion implantation machine, including a top shield plate configured to be attached with a top interior surface of the plasma chamber; a bottom shield plate configured to be attached with a bottom interior surface of the plasma chamber; and a rear shield plate configured to be attached with a rear interior surface of the plasma chamber, wherein a rear edge of the top shield plate meets a top edge of the rear shield plate, and wherein a rear edge of the bottom shield plate meets a bottom edge of the rear shield plate, such that the top shield plate, the bottom shield plate and the rear shield plate fit together to substantially cover the chamber's interior surfaces, thus reducing depositions on the inside surfaces of the plasma chamber, while the plasma chamber is operating. |
