| 摘要 |
<p>The amount and area of irradiating excited species onto a surface of an object to be processed can be enlarged; an even irradiation can be performed over the whole surface; and the loss of the effective excited species can be suppressed so as to significantly improve the processing performance and efficiency. A pulse voltage is applied between mutually opposed discharge electrodes (4), thereby causing a corona discharge to occur between the peaks of those discharge electrodes, and the excited species including plasma generated by the corona discharge is irradiated onto the surface of the object to be processed. The discharge electrodes (4) are constituted by a center electrode (11) and two peripheral electrodes (12,13) that are mutually opposed with the center electrode (11) therebetween. A pulse voltage is alternately applied from pulse voltage applying means (16), which is constituted by utilizing an even-multiple voltage rectifying circuit, to the center electrode (11) and two peripheral electrodes (12,13) of the discharge electrodes (4). It is arranged that the corona discharge alternately occur between the center electrode (11) and one of the two peripheral electrodes (12,13).</p> |
