SUBSTRATE HOLDING APPARATUS, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

A substrate holding apparatus by which a liquid entered rear plane side of a substrate can be quickly recovered. The substrate holding apparatus (PH) is provided with a base material (PHB); a first supporting section (46) formed on the base material (PHB) for supporting the rear plane (Pb) of the substrate (P); a first circumference wall section (42), which is formed on the base material (PHB), faces the rear plane (Pb) of the substrate (P) and is arranged to surround the first supporting section (46); and a first recovery port (51) arranged outside the first circumference wall section (42). The liquid (LQ) outside the first circumference wall section (42) is moved to the first recovery port (51) by a gas flow along the first circumference wall section (42) and is recovered.