发明名称 System and method for patterning both sides of a substrate utilizing imprint lithography
摘要 Provided are a method and system for imprinting a pattern formed on surfaces of an imprint mask onto a double-sided substrate. A method includes deforming the surfaces of the first and second imprint stamps to produce respective first and second deformed surfaces, each having an arc therein. A Pressure is applied to bring the deformed first and second surfaces into intimate contact with the first and second substrate surfaces, respectively. The applied pressure substantially flattens the deformed surfaces. And to separate the two surfaces, the applied pressure is released.
申请公布号 US2006131785(A1) 申请公布日期 2006.06.22
申请号 US20050224316 申请日期 2005.09.13
申请人 ASML HOLDING N.V. 发明人 SEWELL HARRY
分类号 B28B1/14 主分类号 B28B1/14
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