| 摘要 |
<P>PROBLEM TO BE SOLVED: To easily generate data of a corrected pattern in matching with the conditions of pattern formation in designing a geometric pattern to be formed on a substrate. <P>SOLUTION: In a generating device for pattern formation data, a correction rule adding unit 3332 adds a correction rule required to a pattern formation process as a correction rule part to pattern formation data having a basic pattern part; and a corrected data generating unit 3333 corrects a pattern element represented by the basic pattern part, in accordance with the correction rule of the correction rule part to generate corrected data. Consequently, the corrected data 93 as the data of a corrected pattern in matching with pattern formation conditions or the like can be generated easily, and the design efficiency of a pattern can be improved. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
