| 摘要 |
<P>PROBLEM TO BE SOLVED: To measure the position of a mark with a high accuracy, even when both ends of the mark are deformed, while both ends of the mark run off the visual field of a measurement. <P>SOLUTION: A mark-position measuring device has a first arithmetic operation means, arithmetically operating the position of the mark by using all feature waveforms appearing in a detecting signal, obtained by detecting the mark containing a plurality of patterns formed on a body, and a second arithmetic operation means arithmetically operating the position of the mark by using the feature waveforms on the inside of both ends, with the exception of the feature waveforms at both ends in a plurality of the feature waveforms appearing in the detecting signal. The mark-position measuring device further has a storage means where a mark information related to the form of the mark and a region information related to the size of a detecting region are stored previously. The mark-position measuring device further has a decision means of deciding whether the patterns are projected from the detecting region in the mark and using an arithmetic-operation result by the first arithmetic operation means, when the patterns are projected and the arithmetic-operation result by the second arithmetic operation means, when the patterns are not projected as the results of the measurements. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
