发明名称 MANUFACTURING METHOD FOR SILICON OPTICAL COMPONENT, SILICON OPTICAL COMPONENT MANUFACTURED BY METHOD, AND IMAGE INPUT/OUTPUT APPARATUS TO WHICH IT IS APPLIED
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method for a silicon optical component, an optical component manufactured by that method, and an image input/output apparatus to which it is applied. <P>SOLUTION: This manufacturing method for the silicon optical component comprises, as its main features, a process to prepare a silicon substrate, a process to form polysilicon for the purpose of forming a minute defective curvature having minute cavities at least in part of the substrate surface, a process to form the minute defective curvature having minute cavities generated due to the oxidation rate difference between the polysilicon and a substance that forms the foregoing substrate in an interface between a silicon oxidized layer and the substrate in the forming process of the silicon oxidized layer that oxidize the surface of the substrate where the polysilicon is formed, process to expose the minute defective curvature formed in the interface between the silicon oxidized layer and the substrate in the forming process of the silicon oxidized layer after etching the part where polysilicon is formed in the silicon oxidized layer, and a process to form a doping region by doping the exposed minute joint curvature part in an opposite fashion to the substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006165544(A) 申请公布日期 2006.06.22
申请号 JP20050342948 申请日期 2005.11.28
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 SONG IN-JAE;CHOI BYOUNG-IYONG
分类号 H01L27/146;H01L31/10;H01L33/34 主分类号 H01L27/146
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