| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reticle replacement unit for moving a reticle in a lithography device. <P>SOLUTION: The surface of reticle is protected by a pellicle fitted to the reticle by a gas-permeable pellicle frame. The reticle replacement unit comprises a reticle preparation chamber; a reticle moving unit arranged so that a plurality of exposed gas-permeable parts of the pellicle frame are faced toward the inside of the reticle preparation chamber; and a purge gas pressure and exhaust pressure supplying device connected to the reticle preparation chamber and arranged so as to alternately supplying the purge gas pressure and the exhaust pressure, which is lower than the purge gas pressure, to the reticle preparation chamber, when the exposed gas-permeable parts of the pellicle frame are faced toward the inside of the reticle preparation chamber so that gas flows through the pellicle frame into/from pellicle space between pellicle and reticle alternately. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
