| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system and method utilizing a dynamic optical system that is adjustable, possibly automatically adjustable in response to measured or detected characteristics of an illumination beam and/or patterned illumination beam, which system and method do not affect throughput during correction and/or disturb other optical characteristics. <P>SOLUTION: The system includes: an illumination system for producing a beam of radiation; a patterning device for patterning the beam of radiation; a projection system for projecting the patterned beam onto a target point of an object at an image plane; a feedback system for detecting at least a part of the projected patterned beam falling on the image plane and generating a control signal based on the detection; a dynamically adjustable optical element; and a generator for generating an electric field to be applied on the optical element based on the control signal. The electric field applied on the optical element changes the index of refraction in at least one direction in the optical element. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
