| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography device and a device manufacturing method capable of restricting or preventing a deformation of a movable constituent element during acceleration. <P>SOLUTION: A lithography device comprises an illumination system constructed so as to adjust radiation beam; a pattern forming equipment support part constructed so as to support pattern forming equipment that can give a pattern to the radiation beam in its sectional face and can form the radiation beam formed with pattern; a substrate support part constructed so as to hold a substrate; and a projection system constructed so that the radiation beam formed with pattern is projected on a target part of the substrate. An actuator assembly is constructed so as to move one of the support parts having 6 free degrees including directions of x, y, z, rx, ry, and rz. A controller controls the actuator assembly, and the controller includes at least one compensator 46 designed to dynamically decouple the dynamics of the actuator assembly in its free degree. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
