| 摘要 |
PROBLEM TO BE SOLVED: To improve treatment quality by improving reproducibility of the treatment liquid discharge pressure (especially, the pressure in discharge starting time) from a nozzle. SOLUTION: The resist liquid supply mechanism 132 fills in advance a pump 150 with a resist liquid R for at least one application treatment via a suction tube 148 from a bottle 146 storing the resist liquid R, the resist liquid is forcibly fed to a resist nozzle 120 from the pump 150 at a prescribed pressure via a discharge tube 136 in application treatment, and the resist liquid R is discharged at a prescribed flow rate on a substrate G from the resist nozzle 120. A controller 160 controls each of opening/closing valves 152, 158, 162 of the resist liquid supply mechanism 132, the pump 150, and the nozzle movement mechanism 134 in accordance with programmed sequence and various set values. COPYRIGHT: (C)2006,JPO&NCIPI
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