| 摘要 |
PROBLEM TO BE SOLVED: To realize reliable capacitor structure whereby the surface roughness in the upper electrode of capacitor structure is controlled while securing excellent capacitor characteristics. SOLUTION: An upper electrode layer 29 is processed into two or more electrode shapes by lithography and following dry etching. After carrying out pattern formation of two or more upper electrodes 31, RTA treatment is performed at the treatment temperature within the range of 400°C-1,000°C and at the value of oxygen flow rate within the range of 0.1 L/minute-100 L/minute, and then annealing treatment is continuously performed for 60 minutes at the treatment temperature of 650°C in oxygen atmosphere. COPYRIGHT: (C)2006,JPO&NCIPI
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