| 摘要 |
A lithography method for improving contrast includes the following steps: To provide a light source. To provide a first plate including at least one opening rotates according to at least one angular velocity. To provide a mask having patterns on it. To provide a second plate including at least one block corresponding to the opening rotates according to the same angular velocity as the first plate. The method also includes a step to perform an exposure process such that zero order light diffracted by the mask is hindered by the block.
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