| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming body that is efficiently manufactured by forming a highly fine pattern, and to provide its manufacturing method. <P>SOLUTION: The method for manufacturing the pattern forming body includes a process for forming a semiconductor photocatalyst containing layer for forming the semiconductor photocatalyst containing layer containing at least the semiconductor photocatalyst and a resin on a base substance, a process for irradiating plasma for introducing fluorine by irradiating the plasma as a fluorine compound is made an introduction gas on the semiconductor photocatalyst containing layer, and a process for forming a wetting change pattern for forming the wettability change pattern lowering wetting with liquid of the semiconductor photocatalyst containing layer irradiating the semiconductor photocatalyst containing layer introducing fluorine with energy in the form of a pattern. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
