| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of moving a substrate in a different direction without switching the direction of a liquid flowing between a projection system of the lithographic apparatus and the substrate, in the lithography apparatus having a liquid supplying system. <P>SOLUTION: This lithographic apparatus has an input port for supplying the liquid to a space between the projection system of the lithography apparatus and the substrate, and an output port for removing at least one part of the liquid. The lithographic apparatus has a liquid supplying system for rotating any one or both of the input port and output port around an axis line substantially perpendicular to an exposure plane of the substrate. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
