发明名称 VACUUM DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a static eliminator which is installed in a wind-up-type electron-beam vacuum deposition apparatus for continuously forming a vapor-deposited thin film on the substrate of a long plastic film with the use of an electron beam, and prevents dust produced by an electrode of the static eliminator from being caught between plastic films so as not to cause defects and from being caught between an electrode and a grounding terminal so as not to cause a short circuit, even when having been used for a long period of time. SOLUTION: The vacuum deposition apparatus has the static eliminator having a face electrode installed at or around a position at which the long plastic film is separated from a coating roll, wherein the negative electrode of the static eliminator is made from a carbon material. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006161099(A) 申请公布日期 2006.06.22
申请号 JP20040354168 申请日期 2004.12.07
申请人 TOYOBO CO LTD 发明人 IZEKI SEIJI
分类号 C23C14/56;C23C14/20;C23C14/30 主分类号 C23C14/56
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