发明名称 |
Semiconductor methods and structures |
摘要 |
A method and a structure are provided for preventing lift-off of a semiconductor monitor pattern from a substrate. A semiconductor structure and a semiconductor monitor structure are formed on a substrate. A material layer is formed covering the semiconductor monitor structure. A part of the semiconductor structure is removed without removing the semiconductor monitor structure, by using the material layer as an etch protection layer. A mask for the method is also provided. The mask includes a clear area and a dark area. The dark area prevents a semiconductor monitor structure from being subjected to exposure so as to form a material layer covering the semiconductor monitor structure and prevent removal of the semiconductor monitor structure from the substrate while a part of a semiconductor structure is removed.
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申请公布号 |
US2006131697(A1) |
申请公布日期 |
2006.06.22 |
申请号 |
US20040019693 |
申请日期 |
2004.12.21 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
WU HUA-SHU;LAI TSUNG-MU;CHANG MING-CHIH;LAING CHE-RONG |
分类号 |
H01L29/26;H01L21/30 |
主分类号 |
H01L29/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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