发明名称 DEVELOPMENT COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a composition for developing a photosensitive resin such as a resist without corroding aluminum. SOLUTION: This development composition comprising a combination of components including a basic substance such as sodium hydroxide, an alkaline earth metal salt such as calcium chloride, and polyacrylic acid can be used without corroding aluminum or without depositing a hydroxide of the alkaline earth metal salt as a precipitate. The composition preferably contains the basic substance of 0.01 to 20 wt.%, the alkaline earth metal salt of 0.001 to 5 wt.%, the polyacrylic acid of 0.001 to 5 wt.% and water of 70 to 99.99 wt.%. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006163255(A) 申请公布日期 2006.06.22
申请号 JP20040358170 申请日期 2004.12.10
申请人 TOSOH CORP 发明人 HARA YASUSHI;TAKAHASHI FUMIHARU;HAYASHI HIROAKI
分类号 G03F7/32;H01L21/027 主分类号 G03F7/32
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