| 摘要 |
A lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substrate, and a projection system arranged to project the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system is configured to at least partly fill a space between the projection system and an object on the substrate table, with a liquid, and a measurement device is configured to obtain a pressure of liquid in the space.
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