| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To estimate the transferred pattern shape formed, using an actually manufactured mask, without transferring to a substrate. <P>SOLUTION: The estimating method comprises a step (S104) of obtaining the transmission image of a specified mask having an opening pattern by irradiating the mask with a charged particle beam, and detecting the charged particle beam transmitted through the mask; a step (S110) of dividing the transmission image of the specified mask into a plurality of specified regions; and a step (S118) of obtaining the transfer shape as an estimated one exposure-transferred to the substrate, using the specified mask, based on the accumulation energy accumulated to the substrate by the charged particle beam in the exposure-transferred to the substrate at each of the plurality of specified regions, using the specified mask. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
