发明名称 |
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, EXPOSURE SYSTEM, AND EXPOSURE METHOD |
摘要 |
<p>A projection optical system (PL) where an image on a first surface (M) is formed on a second surface (P). The projection optical system (PL) has at least one first wedge prism (4) where an incident surface and an exit surface have flat surfaces, the flat surface of the incident surface and the flat surface of the exit surface having a predetermined first wedge angle. The first wedge prism (4) is rotatable substantially about Y-axis, where Z-axis is in the direction normal to the first surface (M), X-axis is in the direction of a line at which the flat surface of the incident surface and the flat surface of the exit surface cross, and Y-axis is in the direction orthogonal to Z-axis and X-axis.</p> |
申请公布号 |
WO2006064728(A1) |
申请公布日期 |
2006.06.22 |
申请号 |
WO2005JP22648 |
申请日期 |
2005.12.09 |
申请人 |
NIKON CORPORATION;OMURA, YASUHIRO |
发明人 |
OMURA, YASUHIRO |
分类号 |
H01L21/027;G02B13/24;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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