| 摘要 |
<P>PROBLEM TO BE SOLVED: To realize high precision focus correction depending on the scanning speed, and the shot size in the scanning direction. <P>SOLUTION: Under a plurality of different synchronous moving speed conditions, a pattern (an inside mark and an outside mark constituting a focus test mark) in a pattern region formed in a measuring reticle on a reticle stage is transferred onto different wafers, respectively, through a projection optical system. After developing these wafers, positional information of the resist image of a focus test mark on each wafer (positional shift between the images of the inside mark and the outside mark) is measured using a superposition measuring apparatus (step 128-132). Subsequently, the speed proportional position term of the amount of defocus at the time of scanning exposure, the speed proportional time term, time term and position term are calculated respectively based on the positional information of the resist image of all focus test marks thus measured (step 134). <P>COPYRIGHT: (C)2006,JPO&NCIPI |
