| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To improve design efficiency of a pattern by individually defining a basic pattern and a correction rule on pattern formation, in pattern forming data to be used on forming a geometric pattern on a substrate. <P>SOLUTION: A data generating apparatus converts a description format of basic pattern CAD data into XML to generate pattern formation data 91, adds a rule addition index 912 representing pattern formation conditions and an object pattern element to the pattern formation data 91, and further adds a correction rule as a correction rule part 913 acquired from a database, based on the rule addition index 912. Since the pattern formation data 91 include a basic pattern part 911 and the correction rule part 913, the basic pattern and the correction rule on pattern formation are defined individually, which easily improves design efficiency of a pattern. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
