发明名称 SUBSTRATE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a rotary coater in which even a treating liquid to be easily dried and solidified can surely be cleaned without decreasing the operation rate by cleaning the inside of a cup in each treatment. SOLUTION: A part of the scatter preventing cup 7 is cleaned little by little by changing the position of the scatter preventing cup 7 and a flow straightening plate 17 to an edge rinse nozzle 21 in each treatment of the substrate W and the whole surface of the cup 7 are cleaned when the treatment of the certain number of the substrates W is finished. Because a SOG (spin on glass) liquid is cleaned before being solidified in this way, the deposited SOG liquid is easily removed to prevent the lowering of the apparatus operation rate. In addition to this, because the whole surface of the scatter preventing cup 7 is not cleaned at a time, but a part thereof is cleaned little by little, the remarkable lowering of the atmospheric temperature caused by the vaporization of the cleaning liquid is suppressed and the in-plane uniformity of of the film thickness is never deteriorated. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006159011(A) 申请公布日期 2006.06.22
申请号 JP20040350834 申请日期 2004.12.03
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 GOTO SHIGEHIRO;SHIGEMORI KAZUSHI;HISAI AKIHIRO
分类号 B05C11/08;B05C11/10;B08B3/02;H01L21/027;H01L21/304;H01L21/31 主分类号 B05C11/08
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