| 摘要 |
The present invention relates to a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the lithographic apparatus includes an exchangeable object handling apparatus for exchanging an exchangeable object with an exchangeable object loading station and a support, the exchangeable object handling apparatus including three or more end-effectors each capable of exchanging an exchangeable object with one of the supports. Such lithographic apparatus is in particular suited for the streaming of subsequent double exposure jobs.
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