发明名称 |
Method for the deposition of an alloy on a substrate |
摘要 |
In previously known electrodeposition methods, alloys can be deposited only badly on a substrate from the components thereof. The inventive method allows an alloy layer to be deposited on a substrate by pulsing the current/voltage used for electrode position.
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申请公布号 |
US2006131175(A1) |
申请公布日期 |
2006.06.22 |
申请号 |
US20050539938 |
申请日期 |
2005.06.17 |
申请人 |
ANTON REINER;VOGELAERE MARC D;KORTVELYESSY DANIEL;REICHE RALPH |
发明人 |
ANTON REINER;VOGELAERE MARC D.;KORTVELYESSY DANIEL;REICHE RALPH |
分类号 |
C25D3/56;C25D5/18;C25D5/20 |
主分类号 |
C25D3/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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