CHARGED PARTICLE BEAM SYSTEM AND METHOD FOR MAKING SAMPLE BY USING IT

摘要

A charged particle beam system in which the overall system size is reduced without inclining a sample stage, and a micro sample piece including a desired specific region can be separated, or prepared for separation, from a wafer or a chip-like substrate in a short time and a sample for analyzing, observing or measuring a micro region can be made. Throughput of making a sample is enhanced by irradiating a charged particle beam while fixing the angle between a focus column and the sample at about 30° in the arrangement of reducing the machining volume of the sample piece and irradiation of charged particle beam in the charged particle beam system, and by separating the micro sample or preparing separation thereof.