| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a calibration method for a lithographic projection apparatus that is not substantially affected by temperature variations thereof, and a calibration substrate used for the calibration. <P>SOLUTION: The calibration substrate includes a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface. The calibration substrate is made of a material having a small thermal expansion coefficient of, for example less than about 1.0×10<SP>-6</SP>K<SP>-1</SP>, to reduce deformation thereof due to temperature variations of the substrate. The method for the calibration includes imaging a marker provided on a patterning device onto a target position of the calibration substrate with a beam of radiation, measuring a property of the image of the marker on the calibration substrate, determining any error between the measured property and an expected property based on the marker and operating parameters of the apparatus, and adjusting at least one of the operating parameters of the apparatus to correct the error. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
