| 发明名称 |
EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of performing satisfactory exposure processing while maintaining a liquid immersion region in a desired state. <P>SOLUTION: The exposure apparatus EX irradiates a board (P) with exposure light EL via a projection optical system PL and a liquid LQ to expose the board P. The exposure apparatus EX is provided with a liquid immersion mechanism 1 for supplying the liquid LQ and recovering the liquid LQ. The liquid immersion mechanism 1 has an inclined plane 2 formed so as to face the front surface of the board P, and a liquid recovering port 22 of the liquid immersion mechanism 1 is formed on the inclined plane 2. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
| 申请公布号 |
JP2006165500(A) |
申请公布日期 |
2006.06.22 |
| 申请号 |
JP20050169549 |
申请日期 |
2005.06.09 |
| 申请人 |
NIKON CORP;NIKON ENGINEERING CO LTD |
发明人 |
NAGASAKA HIROYUKI;OKUYAMA TAKESHI |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
