| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent the degradation in arrangement accuracy of filters of respective colors with respect to pixels when alignment of masks is performed for every color in patterning of a color filter array of a solid state imaging element. <P>SOLUTION: Apertures are provided in the positions meeting B pixels and R pixels as the patterns to connect the G filters 36 formed on the G pixels lining up in a diagonal line direction at a pixel corner. The B filter film is selectively applied to the aperture (process 50d). An exposure process 50e is performed by using a photomask to generate a boundary between a photoirradiation region and a light shielding region on the G filter 36 in the surroundings of the aperture in the position corresponding to the B pixel and while the B filter film 62b is solidified, the B filter film 62r is removed by a developing process 50f and the B filter 38 defined in the shape by the aperture is formed. The R filter film is selectively applied to the aperture after the B filter film 62r, and the R filter 40 defined in the shape by the aperture is formed similarly to the B filter 38. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
