ION BEAM MEASUREMENT SYSTEMS AND METHODS FOR ION IMPLANT DOSE AND UNIFORMITY CONTROL
摘要
Dosimetry systems and methods are also presented for measuring a scanned ion beam at a plurality of points along a curvilinear path at a workpiece location in a process chamber. An illustrated dosimetry system comprises a sensor and a mounting apparatus that supports support the sensor and selectively positions the sensor at a plurality of points along the curvilinear path, wherein the mounting apparatus can selectively position the sensor to point toward a vertex of the scanned ion beam.
申请公布号
WO2006020643(A3)
申请公布日期
2006.06.22
申请号
WO2005US28278
申请日期
2005.08.08
申请人
AXCELIS TECHNOLOGIES, INC.;PETRY, KLAUS;FERRARA, JOSEPH;BECKER, KLAUS