| 摘要 |
<P>PROBLEM TO BE SOLVED: To take countermeasures against the influence of a liquid in an immersion lithographic apparatus. <P>SOLUTION: The lithographic apparatus includes a supporting structure MT for supporting a pattern providing device MA. The pattern providing device provides a pattern to a radiation beam PB in accordance with a desired pattern. The lithographic apparatus further includes a substrate table WT for supporting a substrate; a projection system PL for projecting a pattern-provided beam to a target portion of the substrate W; a measurement system for measuring a parameter of (a) the substrate table, (b) the substrate, (c) an image projected by the projection system and (d) a combination of any of (a)-(c); and a liquid supplying system for supplying a liquid to a space between the substrate and the projection system. The lithographic apparatus is also includes a shield arranged near one part of the measurement system, and shielding the part of the measurement system from the liquid. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
