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发明名称
WAFER CLEANING METHOD FOR EFFECTIVE REMOVAL OF CHEMICAL RESIDUE
摘要
申请公布号
KR100595140(B1)
申请公布日期
2006.06.22
申请号
KR20040117853
申请日期
2004.12.31
申请人
DONGBU ELECTRONICS CO., LTD.
发明人
YOON, JOON KU
分类号
H01L21/304;H01L21/306
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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